Trichlorosilane

Trichlorosilane (TCS, SiHCl₃, CAS 10025-78-2) yog cov kua uas tsis muaj xim, muaj zog heev, nrog rau cov ntse ntse, txhaws cov tshuaj hydrogen chloride tsw. Boiling ntawm 31.8℃thiab reacting hnyav nrog noo noo, nws yog lub ntsiab feedstock rau lub Siemens txheej txheem los tsim high-purity polysilicon rau photovoltaic hnub ci hlwb thiab semiconductor wafers. TCS kuj tau siv dav hauv silicon epitaxial wafer kev loj hlob, organosilicon synthesis (silicone roj, roj hmab, resins, coupling agents), CVD silicon nyias-zaj duab xis deposition, thiab raws li ib tug xaiv txo tus neeg saib xyuas nyob rau hauv organic synthesis. Muaj nyob rau hauv qib kev lag luam (Ntau dua lossis sib npaug rau 99.0%) thiab qib hluav taws xob (txog 9N purity). Muab faib ua dej-reactive thiab flammable heev (UN 1295, Chav kawm 4.3+2.3, PG I) nrog rau qhov dav dav heev ntawm 1.2%–90.5%; kov tsuas yog nyob rau hauv nruj me ntsis anhydrous tej yam kev mob nrog qhuav nitrogen tiv thaiv.