Chlorosilane

Chlorosilane (Monochlorosilane, SiH₃Cl, CAS 13465-78-6) yog ib qho tsis muaj xim, pyrophoric gas nrog pungent, irritating tsw. Boiling ntawm -30.4℃thiab igniting spontaneously ntawm kev sib cuag nrog huab cua (autoignition<20 °C), it is one of the most reactive members of the chlorosilane family. Freely soluble in carbon tetrachloride, carbon disulfide, ether, and THF, it hydrolyzes violently with moisture to release hydrogen chloride and flammable hydrogen gas. As a critical silicon-source precursor in CVD processes, chlorosilane is widely used for epitaxial silicon wafer growth, polysilicon thin-film deposition, SiC film fabrication for power devices, and the synthesis of organosilicon monomers (silicone oils, rubbers, resins, coupling agents). Classified as water-reactive, pyrophoric, and highly toxic (UN 2986, Class 4.3+2.3, PG I); handle only in sealed cylinders under dry inert atmosphere, strictly isolated from air, moisture, and combustibles.